Mitsubishi Materials developed for thin-film silicon solar battery electrodes of Ag (Ag) nano-ink, IT O (indium tin oxide) SiO2 nano-ink and ink. The Mexican Department of the nanoparticles dispersed in ink made of coated film silicon solar batteries in the Si layer, the electrode can be formed called the back of the sub-micron-thick film. The photoelectric conversion efficiency of the vacuum with the original film fairly.
Thin-film silicon solar batteries have advantages: the amount of silicon crystalline silicon can be reduced to 1 / 100, the energy pay period (the electricity to the power required to manufacture the product run time) is short, and compound semiconductor solar battery with susceptible than non-Te (tellurium) and other restrictions on the amount of raw materials. However, for solar battery manufacturers, the introduction of a variety of vacuum film-forming device of the high initial investment cost is a big problem, need to come into a coating film-forming process significantly reduce costs.
According to reports, the electrode ink can be used to create Dainippon Screen (DNS) of the coating device “Linearcoater” in the 1.4m × 1.1m on the stability of large glass film. This will help to reduce thin-film silicon solar battery manufacturing costs.
Mitsubishi Materials will be November 28, 2011 - December 2, held in Fukuoka City, the “21stInternationalPhotovoltaicScienceandEngineeringConference (PVSEC-21)” published on the results of this development. In addition, Dainippon Screen Manufacturing (DNS) will be November 28, 2011 - November 30 in Shanghai, China at the “PVChina2011″ ink coating on the introduction of this technology.
